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플라즈마 Source  Hollow Cathode
 

MEAglow (Hollow Cathode Plasma Source)

The Next Generation Plasma Source​

lPlasma damage 감소시킴 (낮은 전력으로 플라즈마 발생 가능)
lGrowth Per Cycle(GPC)를 향상시킴 (high flux radical source 형성) 
lOxygen에 의한 오염이 매우 낮음 (oxygen 발생 가능성이 있는 part가 없음)
l스퍼터링에 의한 metal 오염이 낮음 (crystal quality가 매우 높음)
lScalability 가 매우 좋음 (customized source 공급 가능)
lMeaglow’s Plasma Sources have been used with Ammonia, Argon, Chlorine, Hydrogen, Nitrous Oxide, Oxygen, Nitrogen, and other gases too.

Upgrade your Plasma Source today!!!  

▶▶Large Area Hollow Cathode Sources
▶▶UHV Series Hollow Cathode
▼▼ Series 50 Hollow Cathode
■  [제품]  Series 50 Hollow Cathode

Mounted on an NW50 (KF50) vacuum flange, the 50 series Hollow Cathode source is capable of being housed in an NW50 nipple. Widely used for ALD, it features:

l300 or 600 Watt RF or DC operation.
l316 Stainless steel cathode construction (other materials on demand) water cooled.
lReplaceable cathode.
lWide range of gas usage.
lLow oxygen contamination (no dielectric windows).
lLow cost.
lHigh electron density – similar to or higher than inductively coupled and microwave plasma sources.
lWide range of operating pressures (eg. from 100 mTorr to >10 Torr).
lLow plasma damage.
lGases to date: NH3, N2, H2, Ar, O, NO, others possible depending on material atibility.

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