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플라즈마 Source  Hollow Cathode
 

MEAglow (Hollow Cathode Plasma Source)

The Next Generation Plasma Source​

lPlasma damage 감소시킴 (낮은 전력으로 플라즈마 발생 가능)
lGrowth Per Cycle(GPC)를 향상시킴 (high flux radical source 형성) 
lOxygen에 의한 오염이 매우 낮음 (oxygen 발생 가능성이 있는 part가 없음)
l스퍼터링에 의한 metal 오염이 낮음 (crystal quality가 매우 높음)
lScalability 가 매우 좋음 (customized source 공급 가능)
lMeaglow’s Plasma Sources have been used with Ammonia, Argon, Chlorine, Hydrogen, Nitrous Oxide, Oxygen, Nitrogen, and other gases too.

Upgrade your Plasma Source today!!!  

▶▶Large Area Hollow Cathode Sources
▶▶Series 50 Hollow Cathode
▼▼ UHV Series Hollow Cathode
■  [제품]  UHV Series Hollow Cathode

For the UHV series, 3 and 3/8” and 4 and 5/8” conflat vacuum flanges are most ommon, but other sizes are made on request.
These Hollow Cathode plasma sources are often used for ALD equipment conversions, but also for homemade ALD systems.

They feature:
l300 or 600 Watt RF or DC operation.
l316 Stainless steel cathode construction (other materials on request) water cooled.
lWide range of gas usage.
lLow oxygen contamination (no dielectric windows).
lLow cost.
lHigh electron density – similar to inductively coupled sources.
lWide range of operating pressures (eg. from 100 mTorr to >10 Torr).
lLow plasma damage.
lCustomized solutions available.

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