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플라즈마 Source  Hollow Cathode
 

MEAglow (Hollow Cathode Plasma Source)

The Next Generation Plasma Source​

lPlasma damage 감소시킴 (낮은 전력으로 플라즈마 발생 가능)
lGrowth Per Cycle(GPC)를 향상시킴 (high flux radical source 형성) 
lOxygen에 의한 오염이 매우 낮음 (oxygen 발생 가능성이 있는 part가 없음)
l스퍼터링에 의한 metal 오염이 낮음 (crystal quality가 매우 높음)
lScalability 가 매우 좋음 (customized source 공급 가능)
lMeaglow’s Plasma Sources have been used with Ammonia, Argon, Chlorine, Hydrogen, Nitrous Oxide, Oxygen, Nitrogen, and other gases too.

Upgrade your Plasma Source today!!!  

▶▶UHV Series Hollow Cathode
▶▶Series 50 Hollow Cathode
▼▼ Large Area Hollow Cathode Sources
■  [제품]  Large Area Hollow Cathode Sources

 Meaglow has developed a range of wider area plasma source like 12″ diameter plasma sources for ALD and PECVD applications.
These sources have been used to replace existing plasma sources, but also for new systems.

They feature:
l300 to 3000 Watt RF or DC operation.
l316 Stainless steel cathode construction
  (titanium and inconel have also been used, other materials on request).
lWide range of gas usage.
lLow oxygen contamination (no dielectric windows).
lLow cost.
lHigh electron density – one of our 4″ systems had a vale of >1013 cm-3 for nitrogen at 300 watts.
lWide range of operating pressures (eg. from <50 mTorr to >5 Torr).
  However, the pressure can be engineered outside of this range for specific pplications.
lLow plasma damage.
lCustomized solutions available.

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